The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Aug. 12, 2011
Manfred Wiessler, Frankenthal, DE;
Peter Lorenz, Dossenheim, DE;
Heinz Fleischhacker, Dossenheim, DE;
Karola Ursula Fleischhacker, Dossenheim, DE;
Marlen Fleischhacker, Butzbach, DE;
Nadja Fleischhacker, Dossenheim, DE;
Ranjita Ghosh-moulick, Asanol/W.B., IN;
Sandra Gilles, Aachen, DE;
Dirk Mayer, Frechen, DE;
Andreas Offenhaeusser, Eynatten, BE;
Manfred Wiessler, Frankenthal, DE;
Peter Lorenz, Dossenheim, DE;
Heinz Fleischhacker, Dossenheim, DE;
Ranjita Ghosh-Moulick, Asanol/W.B., IN;
Sandra Gilles, Aachen, DE;
Dirk Mayer, Frechen, DE;
Andreas Offenhaeusser, Eynatten, BE;
DEUTSCHES KREBSFORSCHUNGSZENTRUM, Heidelberg, DE;
FORSCHUNGSZENTRUM JUELICH GMBH, Juelich, DE;
Abstract
The present invention concerns a method for applying a first metal onto a second metal, an isolator or semiconductor substrate by a Diels-Alder reaction, in particular a Diels-Alder reaction with inverse electron demand. The present invention further concerns the binding units L 1960 and F 160.