The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Jun. 27, 2014
Applicant:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Inventors:
Tsuyoshi Takihara, Otake, JP;
Eiko Okamoto, Otake, JP;
Go Otani, Otake, JP;
Yusuke Nakai, Otake, JP;
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08G 61/04 (2006.01); C08F 220/36 (2006.01); C08F 290/04 (2006.01); B32B 3/10 (2006.01); B08B 17/06 (2006.01); B29C 59/16 (2006.01); C08F 290/06 (2006.01);
U.S. Cl.
CPC ...
C08F 220/36 (2013.01); B08B 17/065 (2013.01); B29C 59/16 (2013.01); B32B 3/10 (2013.01); C08F 290/046 (2013.01); C08F 290/062 (2013.01); Y10T 428/24355 (2015.01);
Abstract
The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.