The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Oct. 22, 2008
Applicants:
Darren K. Macfarland, Danville, VA (US);
Robert P. Lenk, Danville, VA (US);
Rajesh Shukla, Belle Meades, NJ (US);
Kenneth L. Walker, Semora, NC (US);
Stephen R. Wilson, Danville, VA (US);
Zhiguo Zhou, Winston-salem, NC (US);
Inventors:
Darren K. Macfarland, Danville, VA (US);
Robert P. Lenk, Danville, VA (US);
Rajesh Shukla, Belle Meades, NJ (US);
Kenneth L. Walker, Semora, NC (US);
Stephen R. Wilson, Danville, VA (US);
Zhiguo Zhou, Winston-salem, NC (US);
Assignee:
Luna Innovations Incorporated, Roanoke, VA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 49/00 (2006.01); A61K 49/18 (2006.01); A61K 49/12 (2006.01); B82Y 5/00 (2011.01); C07F 5/00 (2006.01); A61K 47/48 (2006.01);
U.S. Cl.
CPC ...
A61K 49/189 (2013.01); A61K 49/12 (2013.01); B82Y 5/00 (2013.01); C07F 5/00 (2013.01); A61K 47/48961 (2013.01);
Abstract
Endohedral metallofullerene compounds, which in water has a relaxivity of about 30 mMSto about 300 mMSand forms a dispersion in water with entities having an average hydrodynamic radius of less than about 20 nm.