The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Jun. 29, 2012
Applicants:

Farid Golnaraghi, West Vancouver, CA;

Gaofeng Gary Wang, Surrey, CA;

Daniel Eamon Abram, Vancouver, CA;

Combiz Jelveh, North Vancouver, CA;

Inventors:

Farid Golnaraghi, West Vancouver, CA;

Gaofeng Gary Wang, Surrey, CA;

Daniel Eamon Abram, Vancouver, CA;

Combiz Jelveh, North Vancouver, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A42B 1/06 (2006.01); A41D 13/015 (2006.01); A42B 3/06 (2006.01);
U.S. Cl.
CPC ...
A41D 13/015 (2013.01); A42B 3/064 (2013.01);
Abstract

An impact diverting mechanism having a top layer and a bottom layer is provided. The two layers are connected such that the top layer is configured to move in relation to the bottom layer when impacted, and therefore is able to divert impact and reduce rotational and linear acceleration on the bottom layer. The impact diverting mechanism may be attached to, or configured to attach to, an object in need of protection, such as a helmet.


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