The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Jan. 04, 2012
Applicants:

Sangsig Kim, Seoul, KR;

Myeong-won Lee, Seoul, KR;

Youngin Jeon, Gyeonggi-do, KR;

Inventors:

Sangsig Kim, Seoul, KR;

Myeong-Won Lee, Seoul, KR;

Youngin Jeon, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/82 (2006.01); H01L 27/12 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 29/10 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01L 29/775 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0673 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01L 21/0217 (2013.01); H01L 21/02164 (2013.01); H01L 21/02532 (2013.01); H01L 21/02598 (2013.01); H01L 21/30608 (2013.01); H01L 29/1033 (2013.01); H01L 29/42392 (2013.01); H01L 29/517 (2013.01); H01L 29/66439 (2013.01); H01L 29/66568 (2013.01); H01L 29/775 (2013.01); H01L 29/78696 (2013.01); H01L 29/16 (2013.01);
Abstract

A transistor using a single crystal silicon nanowire and a method for fabricating the transistor is disclosed. The transistor using a single crystal silicon nanowire comprises a substrate and a single crystal silicon nanowire formed on the substrate. Here, the single crystal silicon nanowire comprises a source region and a drain region formed longitudinally with the single crystal silicon nanowire and separate from each other, and a channel region located between the source region and the drain region, wherein the perpendicular thickness of the channel region to the longitudinal direction is thinner than the thickness of the source region and the drain region.


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