The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Dec. 27, 2012
Applicant:

Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;

Inventors:

Umberto Rossini, Coublevie, FR;

Raphaël Eleouet, Moirans, FR;

Thierry Flahaut, Cholonge, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/12 (2006.01); H01L 21/762 (2006.01); C30B 25/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76259 (2013.01); C30B 25/02 (2013.01); C30B 25/12 (2013.01); H01L 21/76251 (2013.01);
Abstract

The invention relates to a method for manufacturing a multilayer structure on a first substrate made of a material having a first Young's modulus. The method includes: providing a second substrate covered with the multilayer structure, the multilayer structure having a planar surface opposite the second substrate, the second substrate being made of a material having a second Young's modulus; applying first deformations to said surface; molecularly boding the first substrate to said surface, the molecular bonding resulting in the appearance of second deformation in said surface in the absence of the first deformations, the first deformations being opposite the second deformations; and removing the second substrate, the resulting deformations in said surface being less than 5 ppm.


Find Patent Forward Citations

Loading…