The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Jan. 14, 2015
Applicant:

Nissin Ion Equipment Co., Ltd., Kyoto-shi, Kyoto, JP;

Inventors:

Takeshi Matsumoto, Kyoto, JP;

Koichi Orihira, Kyoto, JP;

Masatoshi Onoda, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/30 (2006.01); H01J 37/244 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01J 37/20 (2013.01); H01J 37/244 (2013.01); H01J 37/3007 (2013.01); H01J 2237/31703 (2013.01);
Abstract

An ion irradiation apparatus is provided. The ion irradiation apparatus includes a support member, a measuring device, and a control device. The support member is larger than the substrate. The measuring device is disposed forwardly in a traveling direction of an ion beam. The ion irradiation apparatus operates in a first mode during which the measuring device is irradiated with a remaining part of the ion beam after being partially shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam; and a second mode during which the measuring device is irradiated with the ion beam without being shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam. The control device controls the substrate so that the ion treatment process is performed in the first mode at least one time during the treatment.


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