The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Sep. 08, 2014
Applicant:

Hgst Netherlands B.v., Amsterdam, NL;

Inventors:

Hardayal Singh Gill, Palo Alto, CA (US);

Shiwen Huang, Fremont, CA (US);

Quang Le, San Jose, CA (US);

Guangli Liu, Pleasanton, CA (US);

Xiaoyong Liu, San Jose, CA (US);

Suping Song, Fremont, CA (US);

Assignee:

HGST NETHERLANDS B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 (2006.01); G11B 5/31 (2006.01); G11B 5/11 (2006.01);
U.S. Cl.
CPC ...
G11B 5/3912 (2013.01); G11B 5/3146 (2013.01); G11B 5/39 (2013.01); G11B 5/3932 (2013.01); G11B 5/11 (2013.01); G11B 2005/3996 (2013.01);
Abstract

Embodiments disclosed herein generally relate to a magnetic head having a sensor stack and a bias material that is aligned in a direction perpendicular to a media facing surface. The sensor stack and a first portion of the bias material are laterally bookended by synthetic antiferromagnetic (SAF) structures, and a second portion of the bias material is laterally bookended by a dielectric material. In this configuration, the SAF structures are decoupled from the bias material, which minimizes the disturbance to the bias material.


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