The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Aug. 03, 2009
Applicants:

Chung-ching Hsieh, Hsin-Chu, TW;

Chia-hsuan Pai, Hsin-Chu, TW;

Cheng-wei Huang, Hsin-Chu, TW;

Te-sheng Chen, Hsin-Chu, TW;

Norio Sugiura, Hsin-Chu, TW;

Inventors:

Chung-Ching Hsieh, Hsin-Chu, TW;

Chia-Hsuan Pai, Hsin-Chu, TW;

Cheng-Wei Huang, Hsin-Chu, TW;

Te-Sheng Chen, Hsin-Chu, TW;

Norio Sugiura, Hsin-Chu, TW;

Assignee:

AU OPTRONICS CORP., Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/48 (2006.01); G02F 1/1337 (2006.01); C09K 19/12 (2006.01); C09K 19/32 (2006.01); C09K 19/04 (2006.01); G02F 1/1333 (2006.01); G02F 1/137 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133711 (2013.01); C09K 19/12 (2013.01); C09K 19/32 (2013.01); C09K 19/322 (2013.01); C09K 2019/0448 (2013.01); C09K 2019/122 (2013.01); G02F 1/133788 (2013.01); G02F 2001/13775 (2013.01); G02F 2001/133397 (2013.01); G02F 2001/133715 (2013.01); G02F 2202/022 (2013.01); G02F 2202/023 (2013.01);
Abstract

A method for manufacturing LCD panels includes providing upper and lower substrates; interposing a liquid crystal material composed of at least one liquid crystal molecule and at least two photosensitive monomers between the upper and lower substrates, at least one first photosensitive monomer having an absorption peak larger than 300 nm and at least one second photosensitive monomer having an absorption peak smaller than 300 nm; applying a voltage between the upper and lower substrates and irradiating with ultra-violet radiation having a first wavelength larger than 300 nm for a first time interval for polymerizing most first photosensitive monomers to provide an alignment polymer; and separately irradiating with ultra-violet radiation having a second wavelength for a second time interval, the second wavelength being larger than the first wavelength. The Irradiating steps are separate and, when irradiating with the first wavelength precedes irradiating with the second wavelength, residual monomers are reduced.


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