The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Dec. 27, 2012
Thad G. Walker, Madison, WI (US);
Michael D. Bulatowicz, Canoga Park, CA (US);
Michael S. Larsen, Woodland Hills, CA (US);
Robert C. Griffith, Woodland Hills, CA (US);
Philip R. Clark, Tarzana, CA (US);
Thad G. Walker, Madison, WI (US);
Michael D. Bulatowicz, Canoga Park, CA (US);
Michael S. Larsen, Woodland Hills, CA (US);
Robert C. Griffith, Woodland Hills, CA (US);
Philip R. Clark, Tarzana, CA (US);
Northrop Grumman Guidance and Electronics Company, Inc., Woodland Hills, CA (US);
Abstract
One embodiment includes a sensor system. The system includes a cell system comprising a pump laser configured to generate a pump beam to polarize alkali metal particles enclosed within a sensor cell. The system also includes a detection system comprising a probe laser configured to generate a probe beam. The detection system can also be configured to calculate at least one measurable parameter based on characteristics of the probe beam passing through the sensor cell resulting from precession of the polarized alkali metal particles in response to an applied magnetic field. The system further includes an AC Stark shift control system configured to frequency-modulate the pump beam and to control a center frequency of a frequency-modulated pump beam based on the characteristics of the probe beam passing through the sensor cell to substantially stabilize and mitigate the effects of AC Stark shift on the at least one measurable parameter.