The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Nov. 21, 2011
Applicants:

Po-hao Yu, Taoyuan Hsien, TW;

Shir-harn Yeh, Taoyuan Hsien, TW;

Yi-ming Wu, Taoyuan Hsien, TW;

Inventors:

Po-Hao Yu, Taoyuan Hsien, TW;

Shir-Harn Yeh, Taoyuan Hsien, TW;

Yi-Ming Wu, Taoyuan Hsien, TW;

Assignee:

DELTA ELECTRONICS, INC., Taoyuan Hsien, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04D 29/54 (2006.01); F01D 25/24 (2006.01);
U.S. Cl.
CPC ...
F04D 29/541 (2013.01); F01D 25/24 (2013.01); F05D 2210/40 (2013.01);
Abstract

An airflow passage structure is applied to a fan. The airflow passage structure includes a sidewall and an airflow channel. The sidewall has uneven thickness. The airflow channel is defined by an inner surface of the sidewall, and includes a channel entrance and a channel exit. The channel exit is in communication with an airflow inlet of the fan. The diameter of the airflow channel is non-uniformly distributed.


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