The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Jun. 23, 2014
Applicant:
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Inventors:
Takanobu Miyashita, Tsukuba, JP;
Yasuyuki Goto, Tsukuba, JP;
Ryousuke Kushibiki, Tsukuba, JP;
Masahiro Aono, Tsukuba, JP;
Masahiro Nishiura, Tsukuba, JP;
Assignee:
TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 3/12 (2006.01); C23C 14/34 (2006.01); C22C 5/04 (2006.01); C22C 1/04 (2006.01); C22C 33/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 1/0466 (2013.01); C22C 5/04 (2013.01); C22C 33/0278 (2013.01); B22F 2998/10 (2013.01); B22F 2999/00 (2013.01);
Abstract
An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.