The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Oct. 17, 2012
Applicant:
Porifera, Inc., Hayward, CA (US);
Inventors:
Valentin Lulevich, Berkeley, CA (US);
Olgica Bakajin, San Leandro, CA (US);
Jennifer E. Klare, Berkeley, CA (US);
Aleksandr Noy, San Carlos, CA (US);
Assignee:
Porifera, Inc., Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 57/10 (2006.01); B01D 67/00 (2006.01); B01D 69/14 (2006.01); B01D 71/02 (2006.01); B82Y 40/00 (2011.01); B01D 71/46 (2006.01);
U.S. Cl.
CPC ...
B29C 57/10 (2013.01); B01D 67/0079 (2013.01); B01D 69/148 (2013.01); B01D 71/021 (2013.01); B01D 71/46 (2013.01); B82Y 40/00 (2013.01);
Abstract
Fabrication methods for selective membranes that include aligned nanotubes can advantageously include a mechanical polishing step. The nanotubes have their ends closed off during the step of infiltrating a polymer precursor around the nanotubes. This prevents polymer precursor from flowing into the nanotubes. The polishing step is performed after the polymer matrix is formed, and can open up the ends of the nanotubes.