The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Mar. 13, 2013
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Donald Joseph Baldwin, Galway, NY (US);

Joseph Garfield Albanese, Rotterdam Junction, NY (US);

Stephen David Dillon, Duanesburg, NY (US);

James Allen Fisk, II, Gansevoort, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01); B05B 12/00 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
B05B 12/00 (2013.01); H05H 1/34 (2013.01); H05H 2001/3468 (2013.01); H05H 2001/3478 (2013.01);
Abstract

Various embodiments include an adjustable gas distribution assembly for an adjustable plasma spray device. In one embodiment, the assembly includes: a first gas distribution ring including a plurality of openings allowing a gas to pass to an inner diameter thereof, the first gas distribution ring including a mating surface upstream of the plurality of openings; and a positioning ring axially aligned with the gas distribution ring between the first gas distribution ring and an electrically charged outlet of the plasma spray device, wherein the positioning ring includes a mating surface that mates with the mating surface of the first gas distribution ring to form the gas distribution assembly, wherein the mating surface of the positioning ring is sized to mate with a plurality of distinct gas distribution rings including the first gas distribution ring.


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