The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Dec. 16, 2013
Iplas Gmbh, Troisdorf, DE;
Ralf Spitzl, Troisdorf, DE;
Arno Behr, Dortmund, DE;
Christian Wolff, Dortmund, DE;
Thorsten Oberreuther, Dortmund, DE;
Iplas GmbH, Troisdorf, DE;
Abstract
A device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. A method for carrying out gas reactions is also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile