The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Mar. 02, 2011
Yunzhi MA, Mountain View, CA (US);
Paul J. Keall, Greenwich, AU;
Lei Xing, Palo Alto, CA (US);
The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);
Abstract
An inverse planning method that is capable of controlling the appearance of the implanted fiducial(s) in segmented IMRT fields for cine MV or combined MV/kV image-guided IMRT is provided. The method for radiation treatment includes computing a radiation treatment plan and delivering beams to a target in accordance with the radiation treatment plan, where computing the radiation treatment plan includes introducing a penalty in an inverse planning objective function optimization calculation to discourage or avoid blockage of one or more fiducials in optimized multi-leaf collimator (MLC) apertures.