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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9224956 B1

PDFFull Text
Date of Patent:
Dec. 29, 2015

Filed:

Mar. 19, 2013

Method for manufacturing organic thin-film element, apparatus for manufacturing organic thin-film element, method for forming organic film, and method for manufacturing organic el element

Applicant:

Joled Inc., Tokyo, JP;

Inventors:

Yuko Kawanami, Osaka, JP;

Ryuuta Yamada, Hyogo, JP;

Assignee:

JOLED INC., Tokyo, JP;

Attorney:

Greenblum & Bernstein, P.L.C.

Primary Examiner:

Michael Trinh

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/00 (2006.01); H01L 51/50 (2006.01); F04B 37/14 (2006.01); C23C 14/56 (2006.01); B01J 3/00 (2006.01); F17D 3/00 (2006.01); H01L 51/56 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0029 (2013.01); B01J 3/006 (2013.01); C23C 14/564 (2013.01); F04B 37/14 (2013.01); F17D 3/00 (2013.01); H01L 51/0021 (2013.01); H01L 51/5056 (2013.01); H01L 51/56 (2013.01); H01L 27/3211 (2013.01); H01L 51/001 (2013.01); Y10T 137/0379 (2015.04);
Abstract

A method for reducing an internal pressure of a vacuum chamber while preventing impurity contamination within the vacuum chamber as much as possible is provided. The method includes: rough pumping reducing an internal pressure of a vacuum chamber by using a roughing pump, the roughing pump being a mechanical pump that is capable of reducing the internal pressure of the vacuum chamber to be less than 15 Pa; main pumping reducing the internal pressure of the vacuum chamber by using a main pump after the rough pumping, the main pump being a non-mechanical pump. Transition from the rough pumping to the main pumping is performed when the internal pressure of the vacuum chamber is no less than 15 Pa.

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