The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Sep. 27, 2013
Applicant:

Sanyo Electric Co., Ltd., Osaka, JP;

Inventors:

Isao Hasegawa, Akashi, JP;

Hitoshi Sakata, Higashi-Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 31/0747 (2012.01); H01L 31/0352 (2006.01); H01L 31/068 (2012.01); H01L 31/0216 (2014.01);
U.S. Cl.
CPC ...
H01L 31/1868 (2013.01); H01L 31/02168 (2013.01); H01L 31/03529 (2013.01); H01L 31/0682 (2013.01); H01L 31/0747 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01);
Abstract

In this method for producing a photoelectric conversion device: an i-type non-crystalline layer and an n-type non-crystalline layer comprising a non-crystalline semiconductor film are formed on the light-receiving surface of a semiconductor substrate; an i-type non-crystalline layer and an n-type non-crystalline layer comprising a non-crystalline semiconductor film are formed on the back surface of the semiconductor substrate; a protective layer is formed on the n-type non-crystalline layer; an insulating layer is formed on the n-type non-crystalline layer; and in the state where the top of the n-type non-crystalline layer is covered by the protective layer, patterning is performed by eliminating a portion of the i-type non-crystalline layer, the n-type non-crystalline layer, and the insulating layer.


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