The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Nov. 28, 2011
Applicants:
Guilei Wang, Beijing, CN;
Junfeng LI, Beijing, CN;
Chao Zhao, Kessel-lo, BE;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/768 (2006.01); C23C 16/44 (2006.01); C23C 16/30 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/505 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02 (2013.01); C23C 16/308 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/4404 (2013.01); C23C 16/505 (2013.01); C23C 16/56 (2013.01); H01L 21/76837 (2013.01);
Abstract
A method for eliminating contact bridge in a contact hole process is disclosed, wherein a cleaning menu comprising a multi-step adaptive protective thin film deposition process is provided, so that a stack adaptive protective thin film is formed on the sidewall of the chamber of the HDP CVD equipment. The stack adaptive protective thin film has good adhesivity, compactness and uniformity to protect the sidewall of the chamber of the HDP CVD equipment from being damaged by the plasma, and avoid the generation of defect particles, thereby improving the HDP CVD technical yield and eliminating the contact bridge phenomenon in the contact hole process.