The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Sep. 28, 2012
Mapper Lithography Ip B.v., Delft, NL;
Marc Smits, Pijnacker, NL;
Chris Franciscus Jessica Lodewijk, Delft, NL;
MAPPER LITOHGRAPHY IP B.V., Delft, NL;
Abstract
An arrangement for generating plasma, the arrangement comprising a primary plasma source () comprising a primary source chamber () and a first coil () for generating plasma in the primary source chamber, a secondary plasma source () comprising a secondary source chamber () and a second coil () for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body () arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet () for emitting at least a portion of the plasma generated by the arrangement.