The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Aug. 27, 2013
Christoph Köhler, Forchheim, DE;
Bernd Schreiber, Forchheim, DE;
Christoph Köhler, Forchheim, DE;
Bernd Schreiber, Forchheim, DE;
SIEMENS AKTIENGESELLSCHAFT, München, DE;
Abstract
A method for the reduction of artifacts based on an unequal representation of the same material classes in various locations, in particular of cupping artifacts, in a three-dimensional image data set, reconstructed from two-dimensional x-ray projection images is provided. An image datum, describing an attenuation value, is allocated respectively to a voxel, wherein at least two material class regions are located in a post-processing step, which receive, in particular, image data, which is homogeneously distributed and lies in an expected material class interval of the attenuation values, and, considering at least one characteristic of the material class regions, calculates a smooth homogenization function, which is to be applied to the image data of the entire image data set and is applied to the image data of the image data set.