The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Dec. 22, 2010
Applicants:

Hiroyuki Takeuchi, Kyoto, JP;

Yutaka Yoneda, Kyoto, JP;

Yasuhiro Isobe, Kyoto, JP;

Inventors:

Hiroyuki Takeuchi, Kyoto, JP;

Yutaka Yoneda, Kyoto, JP;

Yasuhiro Isobe, Kyoto, JP;

Assignee:

HORIBA STEC, Co., Ltd., Kyoto-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
G05D 7/0652 (2013.01); Y10T 137/7784 (2015.04);
Abstract

A mass flow controller with high accuracy flow rate output control is disclosed. In the mass flow controller, relation data that indicates a corresponding relation between a flow rate of a reference gas and a CF value of a sample gas is stored, a target flow rate is converted into a reference gas flow rate by the use of a predetermined CF value, a sample gas flow rate is calculated from the converted reference gas flow rate and a CF value corresponding to the reference gas flow rate, the sample gas flow rate is compared with the target flow rate, and the CF value that is used for conversion of the reference gas flow rate or calculation of the sample gas flow rate is updated by the use of the corresponding relation based on the error between the sample gas flow rate and the target flow rate.


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