The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Feb. 19, 2010
Daniel Paul Sanders, San Jose, CA (US);
Masaki Fujiwara, Cupertino, CA (US);
Yoshiharu Terui, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Masaki Fujiwara, Cupertino, CA (US);
Yoshiharu Terui, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Central Glass Co., Ltd., Tokyo, JP;
Abstract
Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):