The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Aug. 29, 2014
Applicant:

Far Eastern New Century Corporation, Taipei, TW;

Inventors:

Wei-Che Hung, Zhongli, TW;

Da-Ren Chiou, Zhongli, TW;

Yu-June Wu, Zhongli, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3016 (2013.01);
Abstract

A patterned retarder is provided. A microstructure layer is disposed on a substrate of the optical retarder. The microstructure layer has a plurality of trapezoid protrusions. A bottom angel of the trapezoid protrusions is 12-85 degree. A conformal alignment layer and a liquid crystal phase retarder layer are sequentially disposed on the microstructure layer.


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