The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Apr. 03, 2013
Applicant:

Sonoscape Co., Shenzhen, Guangdong, CN;

Inventors:

Yunliang Chen, Guangdong, CN;

Zhengguo Jiang, Guangdong, CN;

Guohu Liu, Guangdong, CN;

Assignee:

SONOSCAPE CO., Shenzhen, Guangdong, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 33/48 (2006.01); G01N 15/12 (2006.01); G01N 15/14 (2006.01); G01N 33/49 (2006.01);
U.S. Cl.
CPC ...
G01N 15/1218 (2013.01); G01N 15/1436 (2013.01); G01N 33/49 (2013.01); G01N 33/4915 (2013.01);
Abstract

An embodiment of a sheath flow device may include: a reflecting plane, aspheric reflecting surface, and a conduit for passage of cells disposed in a central hollow. A focal point of the aspheric reflecting surface is positioned in a location where cells settle. A collimated beam generated by an external light source incident on a first reflective side of the reflecting plane, is reflected to reach a first reflective surface of the aspheric reflecting surface, and reflected before being focused on the focal point, after which the light proceeds to reach a second reflective surface of the aspheric reflecting surface to be reflected to reach a second reflective side of the reflecting plane to emerge after being reflected thereby. The first and second reflective sides and the first and second reflective surfaces may be centrosymmetric. The sheath flow device improves the alignment accuracy of beam commissioning during the application process.


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