The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Sep. 09, 2011
Applicants:

Kenji Shirako, Toyama, JP;

Takatomo Yamaguchi, Toyama, JP;

Shuhei Saido, Toyama, JP;

Akihiro Sato, Toyama, JP;

Inventors:

Kenji Shirako, Toyama, JP;

Takatomo Yamaguchi, Toyama, JP;

Shuhei Saido, Toyama, JP;

Akihiro Sato, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 6/00 (2006.01); H05B 6/22 (2006.01); F28F 1/00 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C30B 25/02 (2006.01); C30B 29/36 (2006.01); F28F 3/08 (2006.01); H01L 21/67 (2006.01); H05B 6/02 (2006.01); H05B 6/10 (2006.01); F28F 21/02 (2006.01);
U.S. Cl.
CPC ...
F28F 1/00 (2013.01); C23C 16/44 (2013.01); C23C 16/4584 (2013.01); C30B 25/02 (2013.01); C30B 29/36 (2013.01); F28F 3/086 (2013.01); H01L 21/67109 (2013.01); F28F 21/02 (2013.01); H05B 6/02 (2013.01); H05B 6/105 (2013.01);
Abstract

Provided is a substrate processing apparatus capable of maintaining a temperature of a furnace port part at a heat-resistant temperature or less of each member constituting the furnace part. The substrate processing apparatus includes a process chamber configured to process a plurality of substrates vertically stacked at predetermined intervals; a substrate retainer configured to hold the plurality of substrates in the process chamber; and a first heat exchanger installed in the process chamber to support the substrate retainer from a lower portion of the substrate retainer, and configured to perform a heat exchange with a gas flowing in a downward direction from a side of the substrate retainer in the process chamber, wherein the first heat exchanger includes a hollow cylindrical insulating tube vertically extending in the downward direction and an insulating plate installed in the insulating tube, and regions in the insulating tube over and under the insulating plate are spatially connected to each other.


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