The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Oct. 20, 2011
Applicant:

Samuel Kah Hean Wong, Johor, MY;

Inventor:
Assignee:

Seagate Technology LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 3/02 (2006.01); B05C 11/00 (2006.01); B05D 5/12 (2006.01); C25D 17/00 (2006.01); B05C 3/10 (2006.01); B05C 3/109 (2006.01); C25D 5/08 (2006.01); C25D 17/08 (2006.01); C25D 21/10 (2006.01);
U.S. Cl.
CPC ...
C25D 17/008 (2013.01); B05C 3/10 (2013.01); B05C 3/109 (2013.01); C25D 5/08 (2013.01); C25D 17/08 (2013.01); C25D 21/10 (2013.01);
Abstract

A plating apparatus includes a vessel and a rack operable to be positioned inside the vessel. The rack includes a number of mandrels including a number of substrate mounting surfaces. The number of mandrels is non-revolving with respect to the rack. The rack further includes a number of gears coupled with the number of mandrels. A partition separates the number of gears from the number of mandrels. A diffuser is positioned below the rack. The diffuser is operable to produce a substantially uniform laminar flow of a fluid from a bottom to a top of the vessel. Thus, the laminar flow may reduce dead zones in the bath and remove defect-causing particles and gases away from the substrate.


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