The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Mar. 01, 2006
Applicants:

Sonia Tulyani, Manchester, CT (US);

Tania Bhatia, Middletown, CT (US);

John G. Smeggil, Simsbury, CT (US);

Inventors:

Sonia Tulyani, Manchester, CT (US);

Tania Bhatia, Middletown, CT (US);

John G. Smeggil, Simsbury, CT (US);

Assignee:

UNITED TECHNOLOGIES CORPORATION, Hartford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01); C04B 41/89 (2006.01); C04B 41/00 (2006.01); C04B 41/52 (2006.01); C23C 26/00 (2006.01); F01D 5/28 (2006.01); C23C 28/04 (2006.01);
U.S. Cl.
CPC ...
C04B 41/89 (2013.01); C04B 41/009 (2013.01); C04B 41/52 (2013.01); C23C 26/00 (2013.01); C23C 28/042 (2013.01); F01D 5/288 (2013.01); F05D 2230/90 (2013.01); F05D 2300/611 (2013.01); Y02T 50/672 (2013.01); Y10T 428/13 (2015.01);
Abstract

A method for depositing a protective coating on a complex shaped substrate includes the steps of: (1) dipping a complex shaped substrate into a slurry to form a base coat thereon, the slurry comprising an aqueous solution, at least one refractory metal oxide, and at least one transient fluid additive present in an amount of about 0.1 percent to 10 percent by weight of the slurry; (2) curing the dipped substrate; (3) dipping the substrate into a precursor solution to form a top barrier coat thereon; and (4) heat treating the dipped, cured substrate to form a protective coating.


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