The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
May. 03, 2012
Applicant:
Michael DE Volder, Ghent, BE;
Inventor:
Michael De Volder, Ghent, BE;
Assignees:
IMEC, Leuven, BE;
Katholieke Universiteit Leuven, KU Leuven R&D, Leuven, BE;
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C01B 31/02 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01); B81C 1/00 (2006.01); C01B 31/00 (2006.01);
U.S. Cl.
CPC ...
C01B 31/0206 (2013.01); B81C 1/00031 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/00 (2013.01); C01B 31/0226 (2013.01); C01B 31/0293 (2013.01); Y10T 428/2481 (2015.01); Y10T 428/2918 (2015.01);
Abstract
Disclosed are methods for fabricating pyrolysed carbon nanostructures. An example method includes providing a substrate, depositing a polymeric material, subjecting the polymeric material to a plasma etching process to form polymeric nanostructures, and pyrolysing the polymeric nanostructures to form carbon nanostructures. The polymeric material comprises either compounds with different plasma etch rates or compounds that can mask a plasma etching process. The plasma etching process may be an oxygen plasma etching process.