The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Jun. 20, 2013
Method of controlling a laser beam annealing apparatus to manufacture thin film transistor substrate
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Byoung-Kwon Choo, Yongin, KR;
Cheol-Ho Park, Yongin, KR;
Hee-Geun Son, Yongin, KR;
Do-Yeob Kim, Yongin, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A method of controlling a laser beam annealing apparatus to manufacture a thin film transistor substrate, the method including: irradiating a laser beam emitted from a laser beam irradiator onto an amorphous silicon layer on a substrate supported by a substrate support; obtaining photographic data with respect to at least a part of the substrate by using a photographic unit; and adjusting a position of at least one of the substrate support or the laser beam irradiator by using a position adjuster based on the photographic data obtained by the photographic unit.