The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Mar. 12, 2012
Applicants:

Noriko Honda, Kakogawa, JP;

Ayaka Watanabe, Saitama, JP;

Kimihiko Kondo, Himeji, JP;

Inventors:

Noriko Honda, Kakogawa, JP;

Ayaka Watanabe, Saitama, JP;

Kimihiko Kondo, Himeji, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 20/26 (2006.01); C08F 6/00 (2006.01); C08F 20/06 (2006.01); C08F 4/04 (2006.01); C08F 2/20 (2006.01); A61L 15/60 (2006.01);
U.S. Cl.
CPC ...
B01J 20/261 (2013.01); A61L 15/60 (2013.01); C08F 2/20 (2013.01); C08F 4/04 (2013.01); C08F 6/006 (2013.01); C08F 6/008 (2013.01); C08F 20/06 (2013.01);
Abstract

A method for producing a water-absorbent resin includes a polymerization step of polymerizing a polymerizable component containing a water-soluble ethylenically unsaturated monomer dissolved in water using a water-soluble azo-type radical polymerization initiator to obtain a reaction system including a water-absorbent resin precursor, and a dehydration step of removing water from the reaction system by heating. In the dehydration step, a water-soluble radical polymerization initiator is added to the reaction system at any first dehydration stage when the residual water rate calculated by the formula (1) is 50% or more, and a reducing substance is added to the reaction system at any second dehydration stage when the residual water rate decreases from that at the first dehydration stage by 10% or more. According to this production method, a water-absorbent resin having satisfactory water-absorption capacity can be produced while suppressing the content of residual monomers.


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