The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2015
Filed:
Apr. 04, 2013
Applicant:
Klaus Kadel, Witten, DE;
Inventor:
Klaus Kadel, Witten, DE;
Assignee:
Boehringer Ingelheim Microparts GmbH, Dortmund, DE;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61M 11/02 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
A61M 11/02 (2013.01); B81C 1/00206 (2013.01); B81C 2201/018 (2013.01); B81C 2201/0112 (2013.01);
Abstract
In a method of producing trench-like depressions in the surface of a wafer, particularly a silicon wafer, by plasma etching, in which the depressions are produced by alternate passivation and etching, each depression in its final geometry is provided with a protective layer of the polytetrafluoroethylene type.
Kadel, Klaus. (2015). Method for producing trench-like depressions in the surface of a wafer (U.S. Patent No. 9220852). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9220852
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile