The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Feb. 05, 2009
Antonio Facchetti, Chicago, IL (US);
Zhihua Chen, Skokie, IL (US);
He Yan, Skokie, IL (US);
Shaofeng LU, Skokie, IL (US);
Tobin J. Marks, Evanston, IL (US);
Yan Zheng, Skokie, IL (US);
Marcel Kastler, Basel, CH;
Subramanian Vaidyanathan, Singapore, SG;
Florian Doetz, Singapore, SG;
Silke Annika Koehler, Basel, CH;
Antonio Facchetti, Chicago, IL (US);
Zhihua Chen, Skokie, IL (US);
He Yan, Skokie, IL (US);
Shaofeng Lu, Skokie, IL (US);
Tobin J. Marks, Evanston, IL (US);
Yan Zheng, Skokie, IL (US);
Marcel Kastler, Basel, CH;
Subramanian Vaidyanathan, Singapore, SG;
Florian Doetz, Singapore, SG;
Silke Annika Koehler, Basel, CH;
BASF SE, Ludwigshafen, DE;
Polyera Corporation, Princeton, NJ (US);
Abstract
Disclosed are new semiconductor materials prepared from rylene-(π-acceptor) copolymers. Such copolymers can exhibit high n-type carrier mobility and/or good current modulation characteristics. In addition, the polymers of the present teachings can possess certain processing advantages such as solution-processability and/or good stability at ambient conditions.