The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2015

Filed:

Mar. 29, 2012
Applicants:

Hiroyuki Uebayashi, Otsu, JP;

Yusuke Tsukamura, Otsu, JP;

Osamu Watanabe, Otsu, JP;

Inventors:

Hiroyuki Uebayashi, Otsu, JP;

Yusuke Tsukamura, Otsu, JP;

Osamu Watanabe, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/28 (2006.01); H01L 31/0203 (2014.01); H01L 31/0216 (2014.01); H01L 31/048 (2014.01); H01L 33/52 (2010.01); H01L 23/29 (2006.01); H01L 23/00 (2006.01); H01L 33/54 (2010.01); H01L 31/0392 (2006.01); C09D 1/00 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 23/296 (2013.01); C09D 1/00 (2013.01); H01L 23/564 (2013.01); H01L 31/0203 (2013.01); H01L 31/02161 (2013.01); H01L 31/0392 (2013.01); H01L 31/048 (2013.01); H01L 33/54 (2013.01); H01L 51/5253 (2013.01); H01L 2924/0002 (2013.01); Y02E 10/50 (2013.01); Y10T 428/24355 (2015.01); Y10T 428/265 (2015.01);
Abstract

An object of the invention is to provide a gas barrier characteristic film that has a gas barrier characteristic and that is excellent in the repetitive reproducibility of the gas barrier characteristic. The film is a gas barrier characteristic film in which an [A] layer and a [B] layer mentioned below are sequentially layered on at least one surface of a macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm.


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