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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9218969 B1

PDFFull Text
Date of Patent:
Dec. 22, 2015

Filed:

Sep. 27, 2011

Method for reducing intermixing between films of a patterning process, patterning process, and device manufactured by the patterning process

Applicants:

Kyoung MI Kim, Anyang-si, KR;

Jin Ha Jeong, Yongin-si, KR;

Inventors:

Kyoung Mi Kim, Anyang-si, KR;

Jin Ha Jeong, Yongin-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Jose R Diaz

Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); G03F 7/40 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); G03F 7/0392 (2013.01); G03F 7/40 (2013.01);
Abstract

An example embodiment relates to a patterning process including forming a photoresist pattern on a structure. The photoresist pattern includes a cross-linked surface that is insoluble in an organic solvent. The process also includes spin-on coating a dielectric layer on the photoresist pattern, partially removing the dielectric layer to form a plurality of dielectric spacers surrounding the photoresist pattern, and removing the photoresist pattern.

Find Patent Forward Citations

Kim, Kyoung. (2015). Method for reducing intermixing between films of a patterning process, patterning process, and device manufactured by the patterning process (U.S. Patent No. 9218969). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9218969

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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