The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Mar. 22, 2012
Hung-chih Yang, Bellevue, WA (US);
Danny B. Lange, Sammamish, WA (US);
Xiong Zhang, Bellevue, WA (US);
Hung-Chih Yang, Bellevue, WA (US);
Danny B. Lange, Sammamish, WA (US);
Xiong Zhang, Bellevue, WA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Techniques for identifying influential users of a social networking service are provided. Influential users may be identified via an algorithm in which an influence score is assigned to each user based at least in part on other members of the community users having taken an affirmative step with respect to the user's communications. Iterative processing may be performed, with each user's influence score being determined by contributions from other users, and each contribution being determined by the contributor's influence score as of a prior iteration. A map-reduce framework may be employed, with data representing the community being partitioned into a plurality of discrete shards, a map process corresponding to each shard calculating an influence score for users represented in the shard, and reduce processes ranking users according to influence score across all shards.