The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Jun. 13, 2014
Globalfoundries Inc., Grand Cayman, KY;
Pavan Bashaboina, San Jose, CA (US);
Osamu S. Nakagawa, Redwood City, CA (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Embodiments of the present invention include systems and methods of controlling reticle transmission. A process window for reticle transmission is received. For a given design, default fill cells of a default fill pattern are inserted in unused areas of an integrated circuit (IC). A pattern density is computed for each tile of an IC at each appropriate level, such as metallization levels and contact levels. An IC reticle transmission (RT) is computed for an area corresponding to an entire (or area of) IC or reticle. If the integrated circuit RT is outside of the process window, then the tiles that have an individual tile RT that is outside of the process window are identified and ranked into groups. Default fill cells in one group of tiles are replaced with replacement fill cells having an appropriate pattern and pattern density, and an updated IC RT parameter is computed until the updated IC RT parameter is within the process window.