The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Aug. 29, 2012
Applicants:
Hiroyuki Nishimura, Tokyo, JP;
Yoshihide Nakao, Tokyo, JP;
Tomoya Kawashima, Tokyo, JP;
Kazuki Yamada, Tokyo, JP;
Keiji Kashima, Tokyo, JP;
Inventors:
Hiroyuki Nishimura, Tokyo, JP;
Yoshihide Nakao, Tokyo, JP;
Tomoya Kawashima, Tokyo, JP;
Kazuki Yamada, Tokyo, JP;
Keiji Kashima, Tokyo, JP;
Assignee:
DAI NIPPON PRINTING CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); G03F 7/20 (2006.01); G02B 5/30 (2006.01); H04N 13/04 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2022 (2013.01); G02B 5/3083 (2013.01); G02F 2001/133631 (2013.01); G02F 2413/09 (2013.01); H04N 13/0434 (2013.01); Y10T 428/24802 (2015.01);
Abstract
A pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. A mask, which has slits that are made narrow compared to the width of a region that is to undergo exposure treatment and are provided for exposure treatment, is manufactured.