The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Sep. 04, 2013
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Inventor:
Suigen Kyoh, Nagoya, JP;
Assignee:
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 1/70 (2012.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 1/22 (2013.01);
Abstract
A photomask according to the present embodiment is used to transfer a pattern to a transfer target substrate in a non-telecentric optical system. A mask substrate includes a first face having a pattern formed thereon and a second face on an opposite side from the first face. A convex portion or a concave portion is formed on the second face in order to correct a position difference in a transfer pattern occurring when the pattern is transferred to the transfer target substrate. The convex portion is formed of a material different from that of the mask substrate.