The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Sep. 18, 2013
Applicant:
Xennia Holland B.v.;
Inventors:
Gerrit Koele, Diepenheim, NL;
Alan Hudd, Bourn, GB;
Assignee:
XENNIA HOLLAND B.V., Nijverdal, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 15/08 (2006.01); B41J 15/00 (2006.01); D06M 23/16 (2006.01); B41J 2/21 (2006.01); B41J 3/407 (2006.01); B41J 3/54 (2006.01); B41J 11/00 (2006.01); B41J 11/46 (2006.01); B41J 19/16 (2006.01); G06K 15/10 (2006.01); D06P 5/30 (2006.01);
U.S. Cl.
CPC ...
D06M 23/16 (2013.01); B41J 2/2132 (2013.01); B41J 3/4078 (2013.01); B41J 3/543 (2013.01); B41J 11/0095 (2013.01); B41J 11/46 (2013.01); B41J 19/16 (2013.01); G06K 15/107 (2013.01); D06P 5/30 (2013.01); Y10T 428/2481 (2015.01); Y10T 428/24802 (2015.01); Y10T 442/20 (2015.04); Y10T 442/2164 (2015.04); Y10T 442/2262 (2015.04); Y10T 442/2279 (2015.04); Y10T 442/2352 (2015.04); Y10T 442/2361 (2015.04); Y10T 442/2377 (2015.04); Y10T 442/241 (2015.04); Y10T 442/2418 (2015.04); Y10T 442/259 (2015.04); Y10T 442/2525 (2015.04); Y10T 442/2582 (2015.04); Y10T 442/2631 (2015.04); Y10T 442/273 (2015.04); Y10T 442/2738 (2015.04);
Abstract
A system for depositing a substance onto a substrate comprises continuously transporting the substrate in a transport direction while traversing a deposition arrangement across the substrate to deposit the substance in a number of swathes. During such movement the positions of the deposition arrangement and the substrate are controlled with respect to one another such that the swathes complement one another to provide substantially uniform coverage of the substrate. As a result of the defined arrangement, improved substrate speeds can be achieved since there is no need for the substrate to stop at each traverse.