The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Dec. 02, 2011
Applicants:

Naoto Takahashi, Yamaguchi, JP;

Yasuyuki Yamamoto, Yamaguchi, JP;

Inventors:

Naoto Takahashi, Yamaguchi, JP;

Yasuyuki Yamamoto, Yamaguchi, JP;

Assignee:

TOKUYAMA CORPORATION, Shunan-shi, Yamaguchi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/16 (2006.01); H05K 1/03 (2006.01); H05K 3/40 (2006.01); H01L 23/15 (2006.01); H01L 23/498 (2006.01); H05K 3/00 (2006.01); H01L 33/62 (2010.01); H05K 3/24 (2006.01); H05K 1/09 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0306 (2013.01); H01L 23/15 (2013.01); H01L 23/49827 (2013.01); H05K 3/0094 (2013.01); H05K 3/4061 (2013.01); H01L 33/62 (2013.01); H01L 2924/0002 (2013.01); H05K 1/092 (2013.01); H05K 3/245 (2013.01); H05K 2203/1476 (2013.01);
Abstract

A via-holed ceramic substrate can be manufactured in a simple method by providing a via-holed ceramic substrate comprising: a sintered ceramic substrate; an electroconductive via formed in the sintered ceramic substrate, the electroconductive via having an electroconductive metal closely filled in a through-hole, the electroconductive metal containing a metal (A) having a melting point of 600° C. to 1100° C., a metal (B) having a melting point higher than the melting point of the metal (A), and an active metal; and an active layer formed in the interface between the electroconductive via and the sintered ceramic substrate.


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