The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Dec. 22, 2014
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Masao Kawaguchi, Osaka, JP;

Hideki Kasugai, Shiga, JP;

Shinichiro Nozaki, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01S 5/34 (2006.01); H01L 33/04 (2010.01); H01S 5/20 (2006.01); H01S 5/343 (2006.01); B82Y 20/00 (2011.01); H01S 5/32 (2006.01); H01L 33/10 (2010.01); H01L 33/32 (2010.01); H01S 5/022 (2006.01); H01S 5/183 (2006.01);
U.S. Cl.
CPC ...
H01S 5/3425 (2013.01); B82Y 20/00 (2013.01); H01L 33/04 (2013.01); H01S 5/18361 (2013.01); H01S 5/2031 (2013.01); H01S 5/3216 (2013.01); H01S 5/34333 (2013.01); H01L 33/10 (2013.01); H01L 33/32 (2013.01); H01S 5/022 (2013.01); H01S 5/18305 (2013.01);
Abstract

A semiconductor light emitting element includes an n-type light guide layer containing a group III nitride semiconductor, an active layer, and a p-type light guide layer, in which the n-type light guide layer includes a semiconductor superlattice layer which is a stack of superlattice layers, the semiconductor superlattice layer having a structure in which group III nitride semiconductors A and group III nitride semiconductors B are alternately stacked, each of the semiconductors A and each of the semiconductors B being stacked in each of the superlattice layers, a relationship Eg (A)>Eg (B) holds, the semiconductor A is a film containing AlInN, and the film contains oxygen (O) at a concentration of at least 1×10cm, the semiconductor A has a film thickness of at most 5 nm, and a current is injected in a stacking direction of the superlattice layers.


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