The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Dec. 04, 2013
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggo-do, KR;

Inventors:

Chaun-Gi Choi, Yongin, KR;

Sun-Kwang Kim, Yongin, KR;

Hui-Won Yang, Yongin, KR;

Sang-Il Park, Yongin, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD, Yongin, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/12 (2006.01); H01L 29/08 (2006.01); H01L 35/24 (2006.01); H01L 51/00 (2006.01); H01J 1/62 (2006.01); H01J 63/04 (2006.01); H01L 29/786 (2006.01); H01L 27/32 (2006.01); H01L 29/417 (2006.01); H01L 21/00 (2006.01); H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); H01L 27/3244 (2013.01); H01L 29/41733 (2013.01); H01L 27/3262 (2013.01);
Abstract

A thin film transistor (TFT) includes a gate electrode disposed on a substrate. An oxide semiconductor layer is disposed on the gate electrode. An insulation layer is disposed on the oxide semiconductor layer. The insulation layer includes a first contact hole that exposes a first part of the oxide semiconductor layer corresponding to a first end of the gate electrode and a second contact hole that exposes a second part of the oxide semiconductor layer corresponding to an opposite end of the gate electrode. A source electrode is disposed on the insulation layer and contacts the first part of the oxide semiconductor layer through the first contact hole. A drain electrode is disposed on the insulation layer and contacts the second part of the oxide semiconductor layer through the second contact hole.


Find Patent Forward Citations

Loading…