The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

May. 21, 2014
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Inventors:

Yasushi Ishii, Kanagawa, JP;

Hiraku Chakihara, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/28 (2006.01); H01L 29/788 (2006.01); H01L 27/115 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28273 (2013.01); H01L 27/11521 (2013.01); H01L 29/42344 (2013.01); H01L 29/66833 (2013.01); H01L 29/7885 (2013.01); H01L 29/792 (2013.01);
Abstract

The performances of a semiconductor device are improved. A semiconductor device has a first electrode and a dummy electrode formed apart from each other over a semiconductor substrate, a second electrode formed between the first electrode and the dummy electrode, at the circumferential side surface of the first electrode, and at the circumferential side surface of the dummy electrode, and a capacitive insulation film formed between the first electrode and the second electrode. The first electrode, the second electrode, and the capacitive insulation film form a capacitive element. Further, the semiconductor device has a first plug penetrating through the interlayer insulation film, and electrically coupled with the first electrode, and a second plug penetrating through the interlayer insulation film, and electrically coupled with the portion of the second electrode formed at the side surface of the dummy electrode opposite to the first electrode side.


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