The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Jun. 10, 2011
Applicants:

Young-min Jung, Asan-si, KR;

Sang-yeoul Lim, Suwon-si, KR;

Kweon-sam Hong, Seoul, KR;

Hong-joon Moon, Cheonan-si, KR;

You-hyun Jeong, Cheonan-si, KP;

Sang-ho Kim, Cheonan-si, KR;

Ho-jun Lee, Anyang-si, KR;

Inventors:

Young-Min Jung, Asan-si, KR;

Sang-Yeoul Lim, Suwon-si, KR;

Kweon-Sam Hong, Seoul, KR;

Hong-Joon Moon, Cheonan-si, KR;

You-Hyun Jeong, Cheonan-si, KP;

Sang-Ho Kim, Cheonan-si, KR;

Ho-Jun Lee, Anyang-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01); G02F 1/1337 (2006.01); G02F 1/1341 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133723 (2013.01); G02F 1/1341 (2013.01); G02F 1/1337 (2013.01); G02F 1/1339 (2013.01); G02F 2001/13415 (2013.01);
Abstract

In a display panel and a method of manufacturing the same, the display panel includes a first display substrate, a second display substrate and a sealing member. The first display substrate includes a first alignment layer in a first display region and a first peripheral region of a first base substrate, and a first backflow-blocking pattern in the first peripheral region and having a curvature to surround a vertex portion of the first display region. The second display substrate includes a second alignment layer in a second display region which faces the first display region and a second peripheral region of a second base substrate. The sealing member includes a corner portion having substantially the same curvature as the first backflow-blocking pattern to surround an outline of the first and second peripheral regions.


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