The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Jan. 18, 2013
Applicant:
Pixtronix, Inc., San Diego, CA (US);
Inventor:
Jianru Shi, Haverhill, MA (US);
Assignee:
Pixtronix, Inc., San Diego, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/02 (2006.01); G06T 1/00 (2006.01); B81B 3/00 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 26/02 (2013.01); B81B 3/00 (2013.01); G02B 26/023 (2013.01); G02B 27/0018 (2013.01); G06T 1/00 (2013.01); Y10T 29/49826 (2015.01);
Abstract
Systems and methods for displays that have a moveable shutter formed on a substrate having an aperture. The shutter, in at least one position, is asymmetrically aligned over the aperture. The asymmetric alignment provides an overlap between shutter and the substrate on one side of the aperture that is larger than an overlap between the shutter and the substrate on another side of the aperture. Typically, the larger overlap increases the ability of the shutter to reduce light passing through the aperture when then shutter is the in the at least one position.