The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Oct. 22, 2013
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);

Inventors:

Darren Lipomi, San Diego, CA (US);

Michael Vosgueritchian, Mountain View, CA (US);

Chee-Keong Tee, Stanford, CA (US);

Sondra Hellstrom, Stanford, CA (US);

Zhenan Bao, Stanford, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 1/26 (2006.01); G01L 1/22 (2006.01); G01L 1/14 (2006.01); H01L 51/00 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
G01L 1/2287 (2013.01); G01L 1/144 (2013.01); G01L 1/22 (2013.01); B82Y 30/00 (2013.01); H01L 51/0048 (2013.01);
Abstract

Apparatuses and methods, consistent with embodiments herein, are directed to an apparatus having a stretchable substrate and a plurality of nanostructures. While the plurality of nanostructures are adhered to the stretchable substrate, the stretchable substrate and the nanostructures are stretched and/or operate in a stretched mode in which the nanostructures are characterized by a resistance corresponding to a strain imparted due to the stretching. When the substrate is relaxed or the stretching otherwise lessened, the nanostructures continue to be characterized as a function of the strain and the corresponding resistance, with buckled segments of the nanostructures being adhered along a surface of the substrate.


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