The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Apr. 07, 2014
Applicant:
Institut Univ. DE Ciéncia I Tecnologia, S.a., Mollet del Vallés, ES;
Inventors:
Joaquin Bigorra Llosas, Sabadell, ES;
Javier Raya, Sant Joan Despi, ES;
Ramon Valls, Barcelona, ES;
Carles Estevez, Sitges, ES;
Lidia Galiéa, Girona, ES;
Josep Castells, Montmeló, ES;
Assignee:
Institut Univ. de Ciencia i Tecnologia, s.a., Barcelona, ES;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/72 (2006.01); C11D 7/50 (2006.01); C11D 1/52 (2006.01); C11D 11/00 (2006.01); C23G 5/028 (2006.01); C23G 5/036 (2006.01);
U.S. Cl.
CPC ...
C11D 7/5013 (2013.01); C11D 1/521 (2013.01); C11D 11/0029 (2013.01); C23G 5/02883 (2013.01); C23G 5/036 (2013.01);
Abstract
Suggested are degreasing compositions comprising at least one dialkyl amide according to general formula (1) RCO—NRR(I) in which RCO stands for a linear or branched, saturated or unsaturated, aliphatic or aromatic, optionally hydroxysubstituted acyl radical having 2 to 56 carbon atoms, and Rand Rrepresent independently from each other alkyl radicals having 1 to 6 carbon atoms.