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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9210939 B1

PDFFull Text
Date of Patent:
Dec. 15, 2015

Filed:

Dec. 17, 2012

Copper-and-titanium-containing composition and production method therefor

Applicant:

Showa Denko K.k., Minato-ku, Tokyo, JP;

Inventors:

So Miyaishi, Toyama, JP;

Yasushi Kuroda, Toyama, JP;

Yasuhiro Hosogi, Toyama, JP;

Ding Li, Toyama, JP;

Assignee:

SHOWA DENKO K.K., Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Abigail Fisher

Assistant Examiner:

Jessica Kassa

Int. Cl.
CPC ...
A01N 59/16 (2006.01); A01N 59/20 (2006.01); B01J 23/72 (2006.01); B01J 37/03 (2006.01); B01J 21/06 (2006.01); B01J 35/00 (2006.01); A01N 55/02 (2006.01); A61L 9/01 (2006.01); B01J 27/055 (2006.01); B01J 27/135 (2006.01); B01J 27/25 (2006.01); B01J 31/38 (2006.01); B01J 27/122 (2006.01);
U.S. Cl.
CPC ...
A01N 59/16 (2013.01); A01N 55/02 (2013.01); A01N 59/20 (2013.01); A61L 9/01 (2013.01); B01J 21/063 (2013.01); B01J 23/72 (2013.01); B01J 27/055 (2013.01); B01J 27/122 (2013.01); B01J 27/135 (2013.01); B01J 27/25 (2013.01); B01J 31/38 (2013.01); B01J 35/004 (2013.01); B01J 37/033 (2013.01);
Abstract

The Cu- and Ti-containing composition of the present invention contains titanium oxide including rutile-crystal-type titanium oxide, and a divalent copper compound, wherein the rutile-crystal-type titanium oxide exhibits the most intense diffraction peak attributed to rutile-type titanium oxide having a full width at half maximum of 0.65° or less, in a Cu—Kα line X-ray diffraction pattern, which is obtained by plotting intensity of diffraction line with respect to diffraction angle 2θ. The composition exhibits excellent anti-viral property under light and in the dark, and excellent organic compound degradability under light.

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