The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Sep. 15, 2011
Applicant:
Mikael Wahlsten, Stockholm, SE;
Inventor:
Mikael Wahlsten, Stockholm, SE;
Assignee:
MYCRONIC AB, Taby, SE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); H05K 3/00 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); H05K 1/02 (2006.01); H05K 3/46 (2006.01);
U.S. Cl.
CPC ...
H05K 3/0008 (2013.01); G03F 7/2053 (2013.01); G03F 9/00 (2013.01); H05K 1/0269 (2013.01); H05K 3/4638 (2013.01); H05K 2201/09918 (2013.01); H05K 2203/163 (2013.01);
Abstract
In a method for generating a pattern on a workpiece having at least one die placed thereon, positions of the at least one die and at least two global alignment marks on the workpiece are measured, pattern adjustment data is generated, pattern image data associated with the pattern to be written is adjusted based on the generated pattern adjustment data, and the pattern is generated on the workpiece based on the modified pattern adjustment data.